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Metamorphic buffers and optical measurement of residual strain

Articolo
Data di Pubblicazione:
2005
Abstract:
It is shown that the residual strain occurring in constant-composition metamorphic buffer layers of III–V heterostructures can be accurately predicted by the suitable design of the epitaxial structures and measured all optically by means of photoreflectance spectroscopy. This result allows one to single out the nonequilibrium models among those that have been proposed to predict strain relaxation. The resulting t−1/2 dependence of the residual in-plane strain on buffer thickness t can be used to design metamorphic buffers not only for 1.3–1.55 m emitting quantum dot structures, but also for sophisticated graded-composition metamorphic structures for different classes of devices.
Tipologia CRIS:
1.1 Articolo in rivista
Keywords:
SISTEMI DI SEMICONDUTTORI III-V; FOTORIFLETTANZA; BUFFER METAMORFICI
Elenco autori:
Geddo, Mario; Guizzetti, Giorgio; Patrini, Maddalena; Ciabattoni, Tiziana; Seravalli, L.; Frigeri, P.; Franchi, S.
Autori di Ateneo:
CIABATTONI TIZIANA
PATRINI MADDALENA
Link alla scheda completa:
https://iris.unipv.it/handle/11571/132916
Pubblicato in:
APPLIED PHYSICS LETTERS
Journal
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