Optimizing band-edge slow light in silicon-on-insulator waveguide gratings

A systematic analysis of photonic bands and group index in silicon grating waveguides is performed, in order to optimize band-edge slow-light behavior in integrated structures with low losses. A combination of numerical methods and perturbation theory is adopted. It is shown that a substantial increase of slow light bandwidth is achieved when decreasing the internal width of the waveguide and the silicon thickness in the cladding region. It is also observed that a reduction of the internal width does not undermine the performance of an adiabatic taper.