Effects of the deposition parameters on the growth of ultrathin and thin SiO2 films
Academic Article
Publication Date:
2007
Iris type:
1.1 Articolo in rivista
Keywords:
SiO2; thin films; rf sputtering; ellipsometry
List of contributors:
Quartarone, Eliana; Mustarelli, Piercarlo; Grandi, Stefania; Marabelli, Franco; Bontempi, L.
Published in: