Data di Pubblicazione:
2006
Abstract:
a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach–
Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Tipologia CRIS:
1.1 Articolo in rivista
Keywords:
Silicon Nitrides; Thin films; Interferometry
Elenco autori:
Ricciardi, C.; Ballarini, V.; Galli, Matteo; Liscidini, Marco; Andreani, Lucio; Losurdo, M.; Bruno, G.; Lettieri, S.; Gesuele, F.; Maddalena, P.; Giorgis, F.
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